METHOD FOR DRAWING UP SINGLE CRYSTAL

PROBLEM TO BE SOLVED: To improve a yield by shortening a draw up time from initiation of trunk formation to separation of a single crystal from melt and drawing up the single crystal without generating dislocation.SOLUTION: A method for drawing up a single crystal includes a first step for forming a...

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Hauptverfasser: ABE YOSHIAKI, KOMATSU HIDEO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve a yield by shortening a draw up time from initiation of trunk formation to separation of a single crystal from melt and drawing up the single crystal without generating dislocation.SOLUTION: A method for drawing up a single crystal includes a first step for forming a trunk C2, a second step for forming a downward-protruding part C3 protruding downward at the crystal end in the final step of trunk formation after the first step, a third step for separating the downward-protruding part formed in the second step from a silicon melt. A magnetic flux density in a horizontal magnetic field, a crystal drawing up speed, and a crystal rotational speed are set lower in the second step than in the first step by 800-1,000 Gause, 0.2-0.5 mm/min. and 1-3 rpm, respectively. A crucible rotational speed is controlled to be in the range of 0.5-5 rpm. 【課題】直胴部形成開始から単結晶を融液から切り離すまでの引き上げ時間を短縮し、有転位化させることなく単結晶を引き上げ、歩留まりを向上する。【解決手段】直胴部C2を形成する第1の工程と、前記第1の工程後、直胴部形成の最終工程において結晶下端に下方に突出する下凸形状C3を形成する第2の工程と、前記第2の工程において形成された前記下凸形状を前記シリコン溶融液から切り離す第3の工程とを含み、前記第2の工程において、前記第1の工程よりも、水平磁場の磁束密度を800〜1000Gauss、結晶引き上げ速度を0.2〜0.5mm/min、結晶回転速度を1〜3rpmの範囲に低く制御し、ルツボ回転速度を0.5〜5rpmの範囲に制御する。【選択図】図2