PLASMA CVD FILM-FORMING DEVICE

PROBLEM TO BE SOLVED: To provide a plasma CVD film-forming device that prevents the occurrence of an abnormal discharge in a section where a substrate is not wound in a range in which a film is formed in an axial direction of a film-forming roller.SOLUTION: A plasma CVD film-forming device 10 includes: a vacuum chamber 1; a metal film-forming roller 2 which has a belt-like substrate wound around a part of the overall periphery of the film-forming roller 2; a magnetic field generation part 3 which is arranged in the film-forming roller 2, and generates a magnetic field outside the part of the film-forming roller 2, around which the substrate is wound; a power source 4 which is connected to the film-forming roller 2, and applies, to the film-forming roller 2, an AC voltage for generating plasma in a region of the magnetic field; and a cover 9 which covers a part 2a of the film-forming roller 2, is not in contact with the substrate A, and located opposite side to the part 2A around which the substrate A is wound, with a rotation axis of the film-forming roller 2 interposed therebetween. 【課題】成膜ローラの軸方向についての成膜が行われる範囲において基材が巻き掛けられていない部分において異常放電の発生を防止するプラズマＣＶＤ成膜装置を提供する。【解決手段】プラズマＣＶＤ成膜装置１０は、真空チャンバ１と、帯状の基材が当該成膜ローラ２の全周のうちの一部に巻き掛けられる金属製の成膜ローラ２と、成膜ローラ２の内部に配置され、成膜ローラ２における基材が巻き掛けられる部分の外側に磁場を生成する磁場生成部３と、成膜ローラ２に接続され、磁場の領域内にプラズマを生成するための交流電圧を当該成膜ローラ２に印加する電源４と、成膜ローラ２における基材Ａが巻き掛けられる部分２ａに対して当該成膜ローラ２の回転軸を挟んで反対側に位置する当該基材Ａに接触していない部分２ｂを覆うカバー９とを備えている。【選択図】図１