POLYAMIDEIMIDE RESIN AND SEAMLESS BELT USING THE SAME

PROBLEM TO BE SOLVED: To provide a polyamideimide resin which is excellent in low water absorption and solvent solubility and useful for a seamless belt for an electrophotographic apparatus or the like without impairing heat resistance (glass transition temperature) or mechanical properties (tensile...

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Hauptverfasser: HATSUTORI TAKAHIRO, SHINO KATSUYA, IENE TAKEHISA, TANIGAWA MASATO, HAMANO SHIGEYOSHI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a polyamideimide resin which is excellent in low water absorption and solvent solubility and useful for a seamless belt for an electrophotographic apparatus or the like without impairing heat resistance (glass transition temperature) or mechanical properties (tensile strength and tear strength).SOLUTION: There is provided a polyamideimide resin containing 10 to 90 mol% of a constitutional unit represented by the following formula (1) in the polyamideimide resin. (where, Rrepresents an alkyl group having 1 to 5 carbon atoms or -SO-; Rand Rmay be the same or different and each represents hydrogen, a halogen atom, an aryl group or an alkyl group having 1 to 3 carbon atoms, provided that when Ris SO-, Rand Rare not present; and Rrepresents an aryl group which may have a substituent.) 【課題】 本発明は、耐熱性(ガラス転移温度)や機械的特性(引張強度、引裂強度)を損なわずに、低吸水性及び溶剤溶解性に優れ、電子写真機器用導電性シームレスベルトなどに有用なポリアミドイミド樹脂に関する。【解決手段】 下記一般式(1)で表される構成単位をポリアミドイミド樹脂中に10〜90モル%含有するポリアミドイミド樹脂。【化1】(一般式(1)中、R1は、炭素数1〜5のアルキル基または−SO2−を示す。R2およびR3はそれぞれ同じでも異なってもよく、水素、ハロゲン原子、アリール基または炭素数1〜3のアルキル基を表す。ただし、R1が−SO2−のときは無いものとする。R4は置換基を有してもよいアリール基を表す。)【選択図】 なし