MASK AND OPTICAL FILTER MANUFACTURING APPARATUS INCLUDING THE SAME

PROBLEM TO BE SOLVED: To provide a mask and an optical filter manufacturing apparatus for use in a roll-to-roll process, which can uniformly form a pattern on a base film, can improve the quality of a product, and can accurately realize characteristics of the base film.SOLUTION: The apparatus is for...

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Bibliographische Detailangaben
Hauptverfasser:	HONG KYUNG KI, KO DONG HO, JU WON CHEUL, KIM SIN YOUNG, CHO YON IRU, RYU SU YOUNG, YOON HYUK, PARK MOON SOO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a mask and an optical filter manufacturing apparatus for use in a roll-to-roll process, which can uniformly form a pattern on a base film, can improve the quality of a product, and can accurately realize characteristics of the base film.SOLUTION: The apparatus is formed from: a base film 50 wound around a roll; a light source 10 that generates light for exposure; a polarizing plate 30 that is installed at an emission side of the light source and polarizes light generated from the light source; and a mask 40 that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. The entire surface of the base film 50 is irradiated with a uniform light quantity. 【課題】基材フィルムにパターンが均一に形成されることができ、製品の品質が向上し、基材フィルムの特性を正確に具現する、ロールツーロール（ＲｏｌｌｔｏＲｏｌｌ）工程に使用されるマスク及び光学フィルタ製造装置を提供する。【解決手段】ロールに巻き取られる基材フィルム５０と、露光のために光を発生させる光源１０と、光源の出射側に設置され、光源で発生した光を偏光させる偏光板３０と、基材フィルムにパターンを形成し、所定の厚さ及び幅を有するように開口された多数個のガイドスリットが形成されるマスク４０で形成し、基材フィルム５０の全面にわたって光量を均一に照射する。【選択図】図１