VACUUM QUALITY MEASUREMENT SYSTEM

PROBLEM TO BE SOLVED: To provide a gas analyzing device with its complexity minimized or eliminated.SOLUTION: A gas analyzing device for a vacuum chamber includes an electronic processing section 120 is configured to receive mass spectral data, receive input indicating total pressure in the vacuum c...

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Bibliographische Detailangaben
Hauptverfasser:	KENNETH D VAN ANTWERP JR, GERANDO A BRUCKER
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a gas analyzing device with its complexity minimized or eliminated.SOLUTION: A gas analyzing device for a vacuum chamber includes an electronic processing section 120 is configured to receive mass spectral data, receive input indicating total pressure in the vacuum chamber, receive external input from at least one sensor, and employ the mass spectral data, the total pressure in the vacuum chamber, and the external input from the at least one sensor to calculate a vacuum quality index on the basis of at least one criteria of quality. 【課題】複雑性を最小限に抑えたかまたは解消したガス分析装置を提供する。【解決手段】真空チャンバ用のガス分析装置は電子処理部１２０を備えており、この電子処理部１２０が、質量スペクトルデータを受け入れ、真空チャンバ内の全圧を示す入力を受け入れ、少なくとも１つのセンサからの外部入力を受け入れ、これら質量スペクトルデータ、真空チャンバ内の全圧、および少なくとも１つのセンサからの外部入力を用いて、少なくとも１つの品質基準に基づき真空品質指数を算出するように構成されている。【選択図】図１