APPARATUS AND METHOD FOR ELECTROCHEMICAL DEPOSITION

PROBLEM TO BE SOLVED: To provide a system in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electro-chemical deposition tool platform.SOLUTION: The smaller flow is diverted to a dosing unit 262 which may be on a separate platform. The...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	STEVENS JOSEPH J, CHAO SANDY S, RABINOVICH YEVGENIY, OLGADO DONALD J, D'AMBRA ALLEN L, DENOME MARK R
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES
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