PATTERN EVALUATION DEVICE AND SCANNING ELECTRON MICROSCOPE

PROBLEM TO BE SOLVED: To exactly recognize an upper layer portion and a lower layer portion about a pattern having a multilayer structure.SOLUTION: In a pattern evaluation device for evaluating a pattern displayed in an image, selective filtering treatment is applied to acquired image data, a plural...

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Bibliographische Detailangaben
Hauptverfasser:	NAMAI HITOSHI, YAMAZAKI TOMOAKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To exactly recognize an upper layer portion and a lower layer portion about a pattern having a multilayer structure.SOLUTION: In a pattern evaluation device for evaluating a pattern displayed in an image, selective filtering treatment is applied to acquired image data, a plurality of profiles about a position different from the predetermined direction of the image to which the selective filtering is applied is created, an evaluation value for detecting the border is calculated from the plurality of profiles, profiles for boundary detection is created based on the evaluation value, and the position where changes in the profiles for boundary detection is especially remarkable is fixed as a boundary position of the pattern. 【課題】多層構造を有するパターンについて上層部分と下層部分を正確に認識する。【解決手段】画像に表示されたパターンの評価を実行するパターン評価装置は、取得画像データに選択的フィルタ処理を施し、当該選択的フィルタが施された画像の所定方向の異なる位置について複数のプロファイルを作成し、当該複数のプロファイルから、境界を検出するための評価値を算出し、当該評価値から境界検出用プロファイルを作成し、当該境界検出用プロファイルの変化が特に著しい位置をパターンの境界位置とする。【選択図】図３