POLISHING AGENT, POLISHING AGENT SET AND METHOD FOR POLISHING SUBSTRATE

PROBLEM TO BE SOLVED: To provide a polishing agent, a polishing agent set and a polishing method capable of obtaining a polishing speed for a useful insulating material and improving smoothness of a substrate surface.SOLUTION: There is provided a polishing agent which comprises water, cerium oxide p...

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Bibliographische Detailangaben
1. Verfasser:	AKUTSU TOSHIAKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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