PHOSPHORUS DEOXIDIZED COPPER PLATE EXCELLENT IN BRAZABILITY AND PRESS WORKABILITY, AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a phosphorus deoxidized copper plate excellent in brazability and press workability, and a method for manufacturing the same.SOLUTION: The phosphorus deoxidized copper plate excellent in brazability and press workability contains P of 0.004-0.040 mass% and the remain...

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Hauptverfasser: OKAMOTO KENJI, IWASAKI SHOZO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a phosphorus deoxidized copper plate excellent in brazability and press workability, and a method for manufacturing the same.SOLUTION: The phosphorus deoxidized copper plate excellent in brazability and press workability contains P of 0.004-0.040 mass% and the remainder consisting of copper and inevitable impurities. A crystal orientation on the surface of the plate has 1.3-2.3 of a numerical value of I{200}/(I{220}+I{420}) when the X-ray diffraction intensity of a {200} crystal plane is set to I{200}, the X-ray diffraction intensity of a {220} crystal plane is set to I{220} and the X-ray diffraction intensity of a {420} crystal plane is set to I{420}. A surface roughness Ra on the surface of the plate is 0.1-0.3 μm, and the degree of steepness on the surface of the plate is 0.4% or less. 【課題】ろう付け性及びプレス加工性に優れたリン脱酸銅板及びその製造方法を提供する。【解決手段】Pを0.004〜0.040質量%含み、残部が銅及び不可避不純物からなり、板表面における結晶配向が、{200}結晶面のX線回折強度をI{200}とし、{220}結晶面のX線回折強度をI{220}とし、{420}結晶面のX線回折強度をI{420}とした場合に、I{200}/(I{220}+I{420})の数値が1.3〜2.3であり、板表面における表面粗さRaが0.1〜0.3μmであり、板表面における急峻度が0.4%以下である。【選択図】 なし