MULTILAYER FILM MIRROR
PROBLEM TO BE SOLVED: To provide a multilayer film mirror having more resistance to high-intensity light irradiation compared to conventional products.SOLUTION: A multilayer film mirror 10 consists of a multilayer film structure 12, comprising alternately laminated amorphous aluminum oxide layers 14...
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| Format: | Patent |
| Sprache: | eng ; jpn |
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| Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a multilayer film mirror having more resistance to high-intensity light irradiation compared to conventional products.SOLUTION: A multilayer film mirror 10 consists of a multilayer film structure 12, comprising alternately laminated amorphous aluminum oxide layers 141 (refractive index: 1.65078) and amorphous hafnium oxide layers 142 (refractive index: 1.90316), and a protective layer 13 made of amorphous aluminum oxide sequentially formed on a quartz substrate 11.
【課題】高強度の光の照射に対して従来よりも高い耐性を有する多層膜ミラーを提供する。【解決手段】石英基板１１上に、アモルファス酸化アルミニウム１２１（屈折率1.65078）とアモルファス酸化ハフニウム１２２（屈折率1.90316）とを交互に積層してなる多層膜構造１２と、アモルファス酸化アルミニウムからなるプロテクト層１３とを順に形成することにより多層膜ミラー１０を構成する。【選択図】図１ |
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