FILM FORMATION METHOD BY PLASMA ELECTROLYTIC OXIDATION AND METAL MATERIAL

PROBLEM TO BE SOLVED: To provide a film formation method by plasma electrolytic oxidation which enables formation of a film having high corrosion resistance on the surface of a metal by a plasma electrolytic oxidation treatment and a metal material.SOLUTION: A plurality of films different in composi...

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Hauptverfasser:	ONO SACHIKO, KOSHI AKIHIKO, ASO HIDETAKA, RYO KANEHIKO, MORI YOICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a film formation method by plasma electrolytic oxidation which enables formation of a film having high corrosion resistance on the surface of a metal by a plasma electrolytic oxidation treatment and a metal material.SOLUTION: A plurality of films different in composition are formed in a laminated form on the surface of a metal by applying an electric current to the metal in a state where the metal is immersed in an electrolytic solution containing a water-soluble compound as the anode so as to generate plasma discharge between the metal and the electrolytic solution. 【課題】金属の表面に対して、プラズマ電解酸化処理により耐食性の高い皮膜を形成することができるプラズマ電解酸化による皮膜形成方法及び金属材料を提供することを目的とする。【解決手段】水溶性化合物を含有する電解液に金属を陽極として浸漬させた状態で、金属に対して電流を印加することにより、金属と電解液との間にプラズマ放電を発生させて、金属の表面に、組成の異なる複数の皮膜を積層させて形成する。【選択図】図２