LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.SOLUTION: A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply heat energy to and/or remove hea...

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Hauptverfasser:	JOHANNES HENRICUS WILHELMUS JACOBS, BLOKS RUUD HENDRIKUS MARTINUS JOHANNES, LAURENT THIBAUD SIMON MATTHEW, GREGORY MARTIN MASON CORCORAN, HOUBEN MARTIJN, SANDER CATHARINA REINIER DERKS, THOMAS IVO ADAM JOHANNES, REMIE MARINUS JAN, GERBEN PETERS, GUNTHER PIETER LEIN JOSEPH, VERSPAGET COEN CORNELIS WILHELMUS, VAN DER HAM RONALD, KUNEN JOHANN GERTRUDIX CORNELIS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.SOLUTION: A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply heat energy to and/or remove heat energy from the support section. The regulation system comprises a plurality of regulation units that are independently controllable. 【課題】リソグラフィ装置内で液浸流体を使用する際の局所的な熱負荷の影響を低減する。【解決手段】基板を支持する支持テーブルであって、基板を支持する支持セクションと、支持セクションに熱エネルギーを供給し、及び／又はそこから熱エネルギーを除去する調節システムとを有し、調節システムは、個別に制御可能な複数の調節ユニットを備える。【選択図】図８