CLEANING METHOD AND CLEANING DEVICE
PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning device that enable effective cleaning while using more properties effective to micro bubble cleaning.SOLUTION: A cleaning method of applying treatment liquid to a cleaning target to clean the cleaning target comprises a first step (S3...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning device that enable effective cleaning while using more properties effective to micro bubble cleaning.SOLUTION: A cleaning method of applying treatment liquid to a cleaning target to clean the cleaning target comprises a first step (S3) for applying first treatment liquid containing bubbles having relatively small sizes such as micro nano bubbles, nano bubbles, etc. to the cleaning target, and a second step (S4) for applying second treatment liquid containing bubbles such as micro bubbles, etc. having larger sizes than the bubbles contained in the first treatment liquid to the cleaning target to which the first treatment liquid adheres after the first step. After the cleaning using the first treatment liquid, the cleaning is performed by using the second treatment liquid containing the bubbles having larger sizes than the bubbles contained in the first treatment liquid. Therefore, the cleaning using the second treatment liquid is performed by using a desirable property of the relatively large bubbles after the cleaning using the first treatment liquid is performed by using a desirable property of the relatively small bubbles.
【課題】 微細バブルの洗浄に有効なより多くの性質を利用しつつ効果的な洗浄を可能にする洗浄方法及び洗浄装置を提供する。【解決手段】 処理液をかけて被洗浄物を洗浄する洗浄方法であって、マイクロナノバブルやナノバブル等の比較的小さいサイズのバブルを含む第1処理液を前記被洗浄物にかける第1ステップ(S3)と、該第1ステップの後に、前記第1処理液に含まれるバブルより大きいサイズのマイクロバブル等のバブルを含む第2処理液を前記第1処理液が付着した状態の前記被洗浄物にかける第2ステップ(S4)とを有し、第1処理液での洗浄の後に、該第1処理液に含まれるバブルより大きいサイズのバブルを含む第2処理液での洗浄がなされるので、比較的小さいバブルの好ましい性質を利用した第1処理液による洗浄の後に、比較的大きいバブルの好ましい性質を利用した第2処理液による洗浄を行うことができるようになる。【選択図】 図2 |
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