EFEM

PROBLEM TO BE SOLVED: To provide an EFEM which has a structure capable of preventing and suppressing an increase in a stroke amount of a wafer transfer robot in a height direction (increase in size of wafer transfer robot) and an increase in an installation area of the whole EFEM; also copes with an increase in a diameter of a wafer; and can handle a large number of wafers.SOLUTION: In an EFEM 1 which includes a wafer transfer chamber 3 having a wafer transfer robot 5 arranged in an internal space, and a load port 2 provided so as to be adjacent to a front face 32 of the wafer transfer chamber 3; and enables a semiconductor processing device M to be arranged on a rear face 33 of the wafer transfer chamber 3 so as to be adjacent to be the rear face 33, the EFEM 1 adopts such a structure that two buffer stations 4 capable of temporarily storing wafers W are provided side by side in forward and backward directions A, on both side faces 31 of the wafer transfer chamber 3, respectively. 【課題】ウェーハ搬送ロボットの高さ方向へのストローク量の増大化（ウェーハ搬送ロボットの大型化）及びＥＦＥＭ全体の設置面積の増大化を防止・抑制可能な構成でありながら、ウェーハの大径化にも対応しつつ多数枚のウェーハを取り扱うことが可能なＥＦＥＭを提供する。【解決手段】ウェーハ搬送ロボット５を内部空間に配置したウェーハ搬送室３と、ウェーハ搬送室３の前面３２に隣接して設けたロードポート２と、ウェーハ搬送室３の後面３３に半導体処理装置Ｍを隣接して配置可能なＥＦＥＭ１において、ウェーハＷを一時的に収容可能なバッファステーション４をウェーハ搬送室３の両側面３１にそれぞれ２台ずつ前後方向Ａに併設した構成を採用した。【選択図】図１