SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To provide a substrate processing system and the like which can execute an operation of processing a common substrate among a plurality of application and development devices.SOLUTION: A first control unit 6 of a first application and development device 1a and a second control unit 6 of a second application and development device 1b generate a transport schedule 73 being a transport path for each substrate W in the devices 1a and 1b, transport of the substrate W is controlled on the basis of the transport schedule, and inter-device transport mechanisms 50a and 50b perform single wafer transport of the substrate W between the devices 1a and 1b. For a substrate W to be subjected to irregular processing, which is to be transported to and processed in both of the devices 1a and 1b by the inter-device transport mechanisms 50a and 50b, the control unit 6 of one of the application and development devices 1a and 1b generates a general transport schedule for the entire transport path across both of the application and development devices 1a and 1b and transmits a partial transport schedule 73b for the other of the application and development devices 1a and 1b, out of the general transport schedule to the control unit 6 of the other. 【課題】複数の塗布、現像装置間で共通の基板を処理する動作を実行することが可能な基板処理システム等を提供する。【解決手段】第１の塗布、現像装置１ａの第１の制御部６、第２の塗布、現像装置１ｂの第２の制御部６は、装置１ａ、１ｂ内の各基板Ｗの搬送経路である搬送スケジュール７３を作成し、これに基づいて基板Ｗの搬送制御を行い、装置間搬送機構５０ａ、５０ｂ、はこれらの装置１ａ、１ｂ間で基板Ｗを枚葉搬送する。この装置間搬送機構５０ａ、５０ｂによって双方の装置１ａ、１ｂを搬送されて処理される被変則処理基板Ｗに対しては、一方の制御部６により、双方の塗布、現像装置１ａ、１ｂに跨った搬送経路全体である総合搬送スケジュールを作成し、そのうち他方の塗布、現像装置１ａ、１ｂについての部分搬送スケジュール７３ｂを他方の制御部６に送信する。【選択図】図９