VAPOR DEPOSITION APPARATUS FOR FILMING ON A FLAT SUBSTRATE

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus for filming an organic material on a substrate of a flat shape, which can be positioned or moved over a process space by using a transportation device in a vacuum chamber, and in which an evaporator of an organic filming material is arran...

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Bibliographische Detailangaben
Hauptverfasser:	OLAF GAWER, ROLAND KOENIG, REINHARD FENDLER, WINKLER TORSTEN, SASCHA KREHER
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus for filming an organic material on a substrate of a flat shape, which can be positioned or moved over a process space by using a transportation device in a vacuum chamber, and in which an evaporator of an organic filming material is arranged to oppose the substrate in the process space.SOLUTION: There is realized a vapor deposition apparatus for a substrate of a flat shape, which can achieve an excellent homogeneity in the layer thickness and the stoichiometry of a layer at a high evaporation rate. The invention is characterized in that the side of a process space 3 has a boundary defined by a shield part 4 extending, while opposing a substrate 1, to a feeder 5 of a filming material 6, and in that the evaporator is constituted of the feeder 5 of the filming material 6, and a radiator 7 below that feeder. 【課題】本発明は、真空室内で運搬機器を用いてプロセス空間の上に位置決めすることが可能であるか、或いはプロセス空間の上を通過して動かすことが可能である平坦な形状の基板に有機材料を成膜する蒸着装置であって、有機成膜材料の蒸発器がプロセス空間内で基板に対向して配置されている蒸着装置に関する。【解決手段】本発明により、速い蒸発速度で層厚及び層の化学量論の良好な均一性を達成できる平坦な形状の基板のための蒸着装置を実現する。本発明は、プロセス空間３の側方が基板１に対向して成膜材料６の供給機器５にまで延びるシールド部４によって境界を画定されていることと、この蒸発器が成膜材料６の供給機器５とこの供給機器の下の放熱器７とから構成されていることとを特徴とする。【選択図】図１