METHOD FOR ABATING OPTICAL DAMAGES OF SILICA OPTICAL COMPONENT BASED ON OVERALL TREATMENT THEREOF

PROBLEM TO BE SOLVED: To provide a method for abating or preventing damages brought on an optical component by a high-intensity light source (e.g., laser).SOLUTION: In one method for preventing damages brought on an optical component by a high-intensity light source, the optical component is anneale...

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Hauptverfasser:	PHILIP EDWARD MILLER, TED ALFRED LAURENCE, WONG LANA LOUIE, SURATWALA TAYYAB ISHAQ, SHEN NAN, JEFFREY DEVIN BUDE, STEELE WILLIAM AUGUSTUS, FEIT MICHAEL DENNIS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY COMPOUNDS THEREOF GLASS INORGANIC CHEMISTRY JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL NON-METALLIC ELEMENTS PERFORMING OPERATIONS PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for abating or preventing damages brought on an optical component by a high-intensity light source (e.g., laser).SOLUTION: In one method for preventing damages brought on an optical component by a high-intensity light source, the optical component is annealed over a specified period. Another method includes a step of etching an optical component within an etchant including one type of chemical species selected from among hydrofluoric acid, fluoride ions, and dihydrofluoride ions, a step of ultrasonically agitating the etchant between processes, and a step of subsequently rinsing the optical component within a rinsing bath. 【課題】強度の高い光源、例えばレーザにより光学部品に生じる損傷を軽減及び防止する方法の提供。【解決手段】強度の高い光源により光学部品に生じる損傷を防止する１つの方法は、光学部品を所定の時間アニーリングする。他の方法は、フッ化水素酸、フッ化物イオン及び二フッ化水素イオンのうちの１種の化学種を含むエッチング液中で光学部品をエッチングするステップと、プロセスの間にエッチング溶液を超音波で攪拌するステップと、次いで光学部品をすすぎ浴ですすぐステップと、を含む。【選択図】なし