PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a plasma processing device and method that can prevent generation of an adhesion film to a stage disposed in a chamber of a plasma processing device with a simple construction.SOLUTION: A dry etching device 1 has a feeding carrier 5 comprising a holding sheet 6 for h...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IWAI TETSUHIRO, NISHIZAKI NOBUHIRO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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