FILM DEPOSITION APPARATUS
PROBLEM TO BE SOLVED: To provide a method for suppressing productivity reduction due to opening of a vacuum tank of a film deposition apparatus to the atmosphere, by reducing the frequency of replacing a deposition-preventing member.SOLUTION: A film deposition apparatus 1000 is provided with deposit...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a method for suppressing productivity reduction due to opening of a vacuum tank of a film deposition apparatus to the atmosphere, by reducing the frequency of replacing a deposition-preventing member.SOLUTION: A film deposition apparatus 1000 is provided with deposition preventing plates 120 as deposition preventing members disposed turnably in a chamber 111 as a vacuum tank and each having a cross-section formed in a triangle shape. Even if a film is deposited on one face of the deposition preventing member having the cross-section of a polygonal shape, the deposition preventing member is turned to arrange two faces of the non-film-deposited state different from that one face, to face the inner side of the vacuum tank. Thus, the films can be deposited to the three faces of sides of the deposition preventing member, respectively, thereby reducing a frequency of replacing the deposition preventing member to about one third.
【課題】成膜装置の真空槽を大気開放して防着部材を交換する頻度を減らし、生産性が低下することを抑える方法の提供。【解決手段】成膜装置1000において、真空槽としてのチャンバー111の中に断面が三角形に形成され回転可能に設けられた防着部材としての防着板120を備える。断面が多角形に形成された防着部材の多角形のうちの一面に膜が堆積しても、防着部材を回転させて一面とは異なる未成膜面の二面が真空槽の内側に向くように配置することにより、防着部材の側方の三面のそれぞれに膜を付着させることができるので、防着部材を交換する頻度を、略1/3に減らすことができる。【選択図】図2 |
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