RESIN COMPOSITION FOR PATTERN FORMATION, AND RESIN MOLDING HAVING PATTERN AND METHOD OF PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide a resin composition for pattern formation that enables a pattern to be formed on a resin molding of ABS resin without significantly reducing its mechanical properties.SOLUTION: A resin composition for pattern formation comprises a polyphenylene ether resin, and a pol...

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Bibliographische Detailangaben
Hauptverfasser: HORIKAWA GEN, HAMAHIRA EIZO, KIMURA MASAYA
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a resin composition for pattern formation that enables a pattern to be formed on a resin molding of ABS resin without significantly reducing its mechanical properties.SOLUTION: A resin composition for pattern formation comprises a polyphenylene ether resin, and a polystyrene resin. The resin composition is used for producing a resin molding having a pattern by molding an ABS resin with the resin composition. 【課題】ABS系樹脂の樹脂成形品に、その機械物性を著しく低下させることなく、模様を形成することを可能にする模様形成用樹脂組成物を提供すること。【解決手段】ポリフェニレンエーテル樹脂と、ポリスチレン樹脂と、を含む模様形成用樹脂組成物。当該樹脂組成物は、ABS系樹脂を当該樹脂組成物とともに成形して模様を有する樹脂成形品を製造するために用いられる。【選択図】図1