VACUUM PROCESSING APPARATUS, AND VIBRATION CONTROL DEVICE

PROBLEM TO BE SOLVED: To damp vibration of a vibration control object disposed in a vacuum tank.SOLUTION: The fixing part 20 of a vibration control device 5 is fixed on the vibration control object in the vacuum tank, and the vibration control device 5 damps vibration of the vibration control object by a mass part 21, a spring part 22, and a damper part 23. Viscoelastic liquid is not provided in the damper part 23, and either one of a coil 35 and a magnet 36 disposed in the coil 35 is fixed to the mass part 21 and the other is fixed to the fixing part 20. When the mass part 21 vibrates, they are relatively vibrated, an induced electromotive voltage (V) is thereby generated with the vibration, an induction current flowing in the coil 35 forms a magnetic field, and force preventing relative movement is applied between the coil 35 and the magnet 36. Thereby, vibration of the mass part 21 is damped by the damping coefficient (c) of the damper part 23, the mass (m) of the mass part 21, and the spring constant (k) of the spring part 22. 【課題】真空槽内に配置される制振対象物の振動を減衰させる。【解決手段】真空槽内の制振対象物上に制振装置５の固定部２０が固定されており、制振装置５は、質量部２１と、バネ部２２と、ダンパ部２３とで、制振対象物の振動を減衰させる。ダンパ部２３には、粘弾性液は設けられておらず、コイル３５と、コイル３５内に配置された磁石３６とは、一方が質量部２１に固定され、他方が固定部２０に固定されており、質量部２１が振動したときに相対的に振動すると、振動に伴ってコイル３５に誘導起電圧（Ｖ）が発生し、コイル３５に流れた誘導電流が磁界を形成し、コイル３５と磁石３６との間に相対移動をさせない力が印加されるので、このダンパ部２３の減衰係数（ｃ）と、質量部２１の質量（ｍ）と、バネ部２２のバネ定数（ｋ）とで、質量部２１の振動が減衰される。【選択図】図８