PRINTED WIRING BOARD MANUFACTURING METHOD AND PRINTED WIRING BOARD
PROBLEM TO BE SOLVED: To provide a manufacturing method of a printed wiring board which has high insulation reliability and high chemical resistance and provide the printed wiring board.SOLUTION: A manufacturing method of a printed wiring board having interconnections on a surface of a polyimide fil...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a manufacturing method of a printed wiring board which has high insulation reliability and high chemical resistance and provide the printed wiring board.SOLUTION: A manufacturing method of a printed wiring board having interconnections on a surface of a polyimide film comprises: 1) a step of forming a metal base layer at least including an electroless metal plating layer in a part of the polyimide film; 2) a step of forming a copper layer to be interconnections on the metal base layer by electroless plating or electrolytic plating to form a copper wiring pattern; and 3) a step of removing a surface of the polyimide film exposed among interconnections by polyimide etching. The electroless metal plating layer formed in the process 1) forms an electroless metal plating layer on a polyimide film surface via a mixed layer of polyimide and metal, which is formed on a polyimide surface layer part, and a heat treatment is performed on the mixed layer at least once after the process 1) and before the process 3).
【課題】絶縁信頼性が高く且つ耐薬品性が高いプリント配線基板の製造方法及びプリント配線基板を提供する。【解決手段】ポリイミドフィルムの表面に配線を有するプリント配線基板の製造方法であって、1)ポリイミドフィルムの少なくとも一部に、少なくとも無電解金属めっき層を含む金属下地層を形成する工程と、2)該金属下地層上に、配線となる銅層を無電解めっき、または電解めっきにより形成し、銅配線パターンを形成する工程と、3)配線間に露出したポリイミドフィルムの表面を、ポリイミドエッチングにより除去する工程とを有し、上記工程1)で形成される無電解金属めっき層は、ポリイミド表層部に形成されるポリイミドと金属との混在層を介して、ポリイミドフィルム表面に無電解金属めっき層を形成しており、かつ、工程1)以降、工程3)より前に、少なくとも1回、混在層に熱処理を行うことを特徴とする、プリント配線基板の製造方法。【選択図】図1 |
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