MATERIAL SUPPLY DEVICE FOR ELECTRON BEAM VAPOR DEPOSITION

PROBLEM TO BE SOLVED: To suppress variation of a film deposition rate by dropping a vapor deposition material before a ball of a tip part of a wire-like vapor deposition material grows.SOLUTION: A material supply device for electron beam vapor deposition includes a vibration mechanism 7 for vibratin...

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Bibliographische Detailangaben
Hauptverfasser:	SHIMIZU YUSUKE, YAMANARI JUNICHI, YAMADA MINORU, ISHIDA TOSHIMICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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