MATERIAL SUPPLY DEVICE FOR ELECTRON BEAM VAPOR DEPOSITION

PROBLEM TO BE SOLVED: To suppress variation of a film deposition rate by dropping a vapor deposition material before a ball of a tip part of a wire-like vapor deposition material grows.SOLUTION: A material supply device for electron beam vapor deposition includes a vibration mechanism 7 for vibrating a tip part of a wire-like vapor deposition material W at the most downstream part to which the wire-like vapor deposition material W is fed. The vapor deposition material can be dropped on a surface of the melted vapor deposition material before the vapor deposition material grows larger or without being grow at all, so that variation of a film deposition rate can be suppressed. 【課題】ワイヤ状の蒸着材料の先端部の球が成長する前に滴下させて成膜レートの変動を抑制する。【解決手段】ワイヤ状の蒸着材料Ｗを送る最下流部位に、ワイヤ状の蒸着材料Ｗの先端部位を振動させる振動機構７を備えることとした。【効果】蒸着材料が大きく成長する前にあるいは全く成長させずに湯面に滴下させることができるので、成膜速度が変動を抑制できる。【選択図】図１