METAL FILM FORMATION METHOD AND CONDUCTIVE INK USED FOR METHOD

PROBLEM TO BE SOLVED: To provide a metal film formation method onto a surface capable of forming a metal film easily by a simple method, onto the surface having a contact with a hole, of a substrate having the hole.SOLUTION: A metal film formation method has a step for heating a substrate in the sta...

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Hauptverfasser: OKITA KENZO, ARITOME ISAO, TANAKA TAKERO, SHIMODA SUGIO, WATABE KAZUTO
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creator OKITA KENZO
ARITOME ISAO
TANAKA TAKERO
SHIMODA SUGIO
WATABE KAZUTO
description PROBLEM TO BE SOLVED: To provide a metal film formation method onto a surface capable of forming a metal film easily by a simple method, onto the surface having a contact with a hole, of a substrate having the hole.SOLUTION: A metal film formation method has a step for heating a substrate in the state where a conductive ink containing a metal salt and a reducer is allowed to have a contact with a surface having a contact with a hole, of a substrate having the hole.
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subjects BASIC ELECTRIC ELEMENTS
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
METALLURGY
PRINTED CIRCUITS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title METAL FILM FORMATION METHOD AND CONDUCTIVE INK USED FOR METHOD
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