SUBSTRATE LAMINATION DEVICE AND SUBSTRATE LAMINATION METHOD

PROBLEM TO BE SOLVED: To provide a substrate lamination device and a substrate lamination method, capable of suppressing occurrence of curing unevenness of an ultraviolet curing resin in an effective pixel region.SOLUTION: A substrate lamination device emits ultraviolet rays from the upper part of a...

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Bibliographische Detailangaben
Hauptverfasser: HATAKEYAMA MICHIKO, ARAKI MASAKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate lamination device and a substrate lamination method, capable of suppressing occurrence of curing unevenness of an ultraviolet curing resin in an effective pixel region.SOLUTION: A substrate lamination device emits ultraviolet rays from the upper part of a vacuum container 10 toward the inside thereof, from a light source 61 provided to the outside of a vacuum container 10, and by reflecting the ultraviolet rays with a light guide member such as a 45° rectangular prism 63, irradiates an uncured ultraviolet curing resin 111 with the ultraviolet rays from the side surface side thereof. A light source position adjustment mechanism 62 adjusts the position of the light source 61 in an X-direction, and then adjusts the irradiation position of ultraviolet rays so that the irradiation position of ultraviolet rays is the central part of the ultraviolet curing resin 111 in a thickness direction.