EVAPORATION SOURCE DEVICE

PROBLEM TO BE SOLVED: To provide an evaporation source device capable of performing fine temperature control of a crucible, and forming a thin film having a uniform film thickness distribution by optimizing a temperature distribution of the crucible in a shorter time.SOLUTION: An evaporation source...

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Bibliographische Detailangaben
Hauptverfasser:	MISAWA KEITA, WATANABE KAZUHIRO, MATSUMOTO EIICHI, KOBAYASHI YOSHIHITO, YAMAZAKI MASAHIRO, YAMADA NAOHITO, KONDO YOSHINARI, MAKI SHUJI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an evaporation source device capable of performing fine temperature control of a crucible, and forming a thin film having a uniform film thickness distribution by optimizing a temperature distribution of the crucible in a shorter time.SOLUTION: An evaporation source device is constituted as follows. A main heater 3 is provided along the longitudinal direction of a crucible 2 storing a vapor deposition material, and an auxiliary heater 4 is provided at least on both ends respectively in the longitudinal direction of the crucible 2 provided with the main heater 3, to thereby enable the main heater 3 and the auxiliary heaters 4 to perform heating control of both ends in the longitudinal direction of the crucible 2.