URETHANE (METH)ACRYLATE AND PHOTOCURABLE RESIN COMPOSITION CONTAINING THE SAME

PROBLEM TO BE SOLVED: To provide: an urethane (meth)acrylate that has a function in which a scratch once incurred on the urethane (meth)acrylate restores to an original state and disappears with time, and that has excellent followability during molding processing, and has excellent dimensional stabi...

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Bibliographische Detailangaben
Hauptverfasser: KUSUMOTO KOJI, ISHIKAWA MASAKAZU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide: an urethane (meth)acrylate that has a function in which a scratch once incurred on the urethane (meth)acrylate restores to an original state and disappears with time, and that has excellent followability during molding processing, and has excellent dimensional stability, bending resistance, and adhesion; and a photocurable resin composition containing the urethane (meth)acrylate.SOLUTION: The allophanate group-containing urethane (meth)acrylate is provided which is represented by the following general formula (1) and the photocurable resin composition containing the same is also provided. (In the formula, Rand Rmay be the same or different and represent a hydrogen atom or a methyl group; Rrepresents a divalent aliphatic, alicyclic, or aromatic hydrocarbon group having 1 to 20 carbon atoms; Rrepresents an aliphatic, alicyclic, or aromatic hydrocarbon group having 1 to 20 carbon atoms; AO and AO may be the same or different and represent an oxyalkylene group having 2 to 4 carbon atoms; and m and n nay be the same or different and is a number from 2 to 10 representing the number of repeating units of the oxyalkylene group).