METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING DEVICE, AND PROGRAM
PROBLEM TO BE SOLVED: To suppress use of a catalyst gas while maintaining a film-forming rate.SOLUTION: A method for manufacturing a semiconductor device includes a step of forming an oxidation film on a substrate by performing a cycle including a step of supplying a material gas to a substrate and...
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| creator | MIZUNO KANEKAZU YANAGIDA KAZUTAKA OKUBO SEIGO HIROSE YOSHIRO |
| description | PROBLEM TO BE SOLVED: To suppress use of a catalyst gas while maintaining a film-forming rate.SOLUTION: A method for manufacturing a semiconductor device includes a step of forming an oxidation film on a substrate by performing a cycle including a step of supplying a material gas to a substrate and a step of supplying an ozone gas to the substrate a prescribed number of times. The material gas supply step supplies the material gas to the substrate in a state in which supply of a catalyst gas to the substrate is stopped. The ozone gas supply step supplies the ozone gas to the substrate in a state in which an amine-based catalyst gas is already supplied to the substrate. |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING |
| title | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING DEVICE, AND PROGRAM |
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