MEMS ELEMENT AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide an MEMS element structure that enables a projection for prevention of contact between a fixed electrode and a movable electrode to be stably manufactured by a method of manufacturing a normal semiconductor device, and a method of manufacturing the MEMS element struct...

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1. Verfasser:	USUI TAKAHIDE
Format:	Patent
Sprache:	eng
Schlagworte:	DEAF-AID SETS ELECTRIC COMMUNICATION TECHNIQUE ELECTRICITY LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKEACOUSTIC ELECTROMECHANICAL TRANSDUCERS MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS PUBLIC ADDRESS SYSTEMS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an MEMS element structure that enables a projection for prevention of contact between a fixed electrode and a movable electrode to be stably manufactured by a method of manufacturing a normal semiconductor device, and a method of manufacturing the MEMS element structure.SOLUTION: A step part 16 is formed by etching a sacrifice layer 13 exposed within a through-hole 15 formed in a fixed electrode 14. Subsequently, a nitride film 17 is formed as an insulator film on the whole surface. After the etching removal of the nitride film 17 on the bottom of the central part of the step part, the sacrifice layer 13 is removed to form a projection 21 made of the nitride film and projected into an air gap 20.