SUBSTRATE SUPPORT DEVICE

PROBLEM TO BE SOLVED: To provide a substrate support device capable of preventing occurrence of defects such as deformation due to thermal strain of a heater plate and improving the temperature uniformity of a wafer by uniformly heating the heater plate when the wafer is heat treated.SOLUTION: A sub...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HANAMACHI TOSHIHIKO, ISHIOKA YASUAKI, HASHIMOTO DAISUKE
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate support device capable of preventing occurrence of defects such as deformation due to thermal strain of a heater plate and improving the temperature uniformity of a wafer by uniformly heating the heater plate when the wafer is heat treated.SOLUTION: A substrate support device comprises: a plate section including a heater plate having a heat generating body therein, a first cooling plate that is disposed on the lower surface of the heater plate and that has a first flow path, and a second cooling plate that is disposed on the upper surface of the heater plate and that has a second flow path; wiring that is connected to the heat generating body and that supplies current to the heat generating body; and a shaft section that has piping supplying refrigerant to the first flow path and the second flow path therein and that supports the plate section. The first flow path includes a spiral flow path that goes around in the first direction toward the outer edge from the central part of the first cooling plate and the second flow path includes a spiral flow path that goes around in the second direction that is an opposite direction to the first direction toward the outer edge from the central part of the second cooling plate.