METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD

PROBLEM TO BE SOLVED: To easily form a beam in a region on a substrate front surface side of a liquid supply port by processing from a rear surface side of the substrate.SOLUTION: A method of manufacturing a liquid discharge head includes: a process of forming a plurality of non-through holes, which...

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Bibliographische Detailangaben
Hauptverfasser: YONEMOTO TAICHI, KISHIMOTO KEISUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To easily form a beam in a region on a substrate front surface side of a liquid supply port by processing from a rear surface side of the substrate.SOLUTION: A method of manufacturing a liquid discharge head includes: a process of forming a plurality of non-through holes, which are formed on a silicon substrate and extend from a first surface of the silicon substrate to a second surface side as an opposite surface to the first surface; and a process of forming a liquid supply port on the silicon substrate by anisotropically etching the silicon substrate with the plurality of non-through holes formed from the first surface. The process of forming the liquid supply port does not remove but retains silicon in a region interposed by the plurality of non-through holes when viewing the silicon substrate from a second surface side, and the retained silicon serves as a beam.