IMAGE FORMING OPTICAL SYSTEM AND PROJECTION EXPOSURE DEVICE FOR MICROLITHOGRAPHY INCLUDING IMAGE FORMING OPTICAL SYSTEM

PROBLEM TO BE SOLVED: To provide a generation method of a fine structure constituent element using an image forming optical system, a reflective image forming optical system, another image forming optical system, a projection exposure device including this type of the image forming optical system, a...

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1. Verfasser: HANS-JUERGEN MANN
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a generation method of a fine structure constituent element using an image forming optical system, a reflective image forming optical system, another image forming optical system, a projection exposure device including this type of the image forming optical system, a generation method of the fine structure constituent element using this type of the projection exposure device, and the fine structure constituent element generated by this method.SOLUTION: An image forming optical system (7) having a plurality of mirrors (M1 to M10) forms an object field (4) of an object plane (5) in an image field (8) of an image plane (9). In an optical path between non-concealed mirrors (M1 to M6), image forming light rays (15) pass through at least one multiple passage area between the planes arranged and spaced apart in parallel to the object plane (5) and/or parallel to the image plane (9). The image forming optical system has at least one pupil plane (76, 77, 78, and 17) which is arranged on the outer side of the multiple passage area between the non-concealed mirrors (M1 to M6). This creates the image forming optical system providing easy image error compensation and also creates another type of the image forming optical system having easy image error compensation accordingly.