GLASS FORMATION SYSTEM AND RELATED APPARATUSES AND METHOD

PROBLEM TO BE SOLVED: To provide a system which allows use of thermal secondary formation for forming a 3D glass cover and a process of forming a plurality of glass products having a consistent shape and high dimensional accuracy.SOLUTION: A glass formation system 100 includes a division delivery ta...

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Hauptverfasser:	DARREL P BAILEY, LJERKA UKRAINCZYK, KEITH R GAYLO, YURIY YURKOVSKY, JOHN H BRENANN, KEVIN L WASSON, DAVID J KUHN, MICHAEL J DAILEY JR, SCOTT W DEMING, KARL EHEMANN, BRIAN C SHEEHAN
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMISTRY DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION GLASS HEAT EXCHANGE IN GENERAL HEATING LIGHTING MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS MECHANICAL ENGINEERING METALLURGY MINERAL OR SLAG WOOL PHYSICS TESTING WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system which allows use of thermal secondary formation for forming a 3D glass cover and a process of forming a plurality of glass products having a consistent shape and high dimensional accuracy.SOLUTION: A glass formation system 100 includes a division delivery table 104, a plurality of enclosures arranged along the division delivery table 104 and a plurality of stations 106 set on the division delivery table 104 in such a way as to be capable of selective division delivery to any of the enclosures. At least one radiation heater is arranged in each enclosure, and a radiation reflector surface and a radiator are arranged in each enclosure. The radiator is located between at least one radiation heater and at least one radiation reflector surface and has a first surface located at a position opposite to at least one radiation heater and a second surface located at a position opposite to the radiation reflector surface.