SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a semiconductor device that allows stabilizing the characteristics and to provide a method of manufacturing the same.SOLUTION: A semiconductor device includes a first electrode, an oxide semiconductor film, an insulating film, a first protection film, a second electrode, and a third electrode. The oxide semiconductor film is provided above the first electrode. The oxide semiconductor film has a first surface on the first electrode side and a second surface on the opposite side of the first surface. The insulating film is provided between the first electrode and the oxide semiconductor film. The first protection film has a first film provided between the insulating film and the first surface; and a second film provided on the second surface. The first protection film prevents a material including hydrogen from intruding into the inner side from the outer side of the oxide semiconductor film. The second electrode is electrically connected to the oxide semiconductor film. The third electrode is electrically connected to the oxide semiconductor film.