SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

PROBLEM TO BE SOLVED: To achieve a semiconductor device having a power MOSFET which supports low resistance and a high junction withstand voltage at the same time in a simple manufacturing method.SOLUTION: A semiconductor device manufacturing method comprises: forming a low-concentration p-type epit...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: KACHI TAKESHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!