PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To obtain a light beam with high illuminance by using a lamp as a light source and employing a simple configuration with fewer optical elements.SOLUTION: A pattern is drawn on a substrate 1 by generating a light beam from a light beam generator and relatively moving a chuck 10...

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Bibliographische Detailangaben
Hauptverfasser:	IWAI SUSUMU, KUDO SHINYA, HAYASHI TOMOAKI, NEMOTO RYOJI, TEZUKA HIDEKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a light beam with high illuminance by using a lamp as a light source and employing a simple configuration with fewer optical elements.SOLUTION: A pattern is drawn on a substrate 1 by generating a light beam from a light beam generator and relatively moving a chuck 10 and a light beam irradiation device 20 to scan the substrate 1 with the light beam from the light beam irradiation device 20. In the light beam generator, light is generated from a lamp 13 that seals high-pressure gas in a bulb; the light generated from the lamp 13 is condensed by an ellipsoidal mirror 14; and the light condensed by the ellipsoidal mirror 14 and having an annular distribution is converted into parallel light beams by an axicon lens 16 and supplied to the light beam irradiation device 20.