METHOD FOR MANUFACTURING ARTICLE

METHOD FOR MANUFACTURING ARTICLE

PROBLEM TO BE SOLVED: To provide a method for manufacturing an article advantageous in terms of overlay accuracy in double patterning (multi-patterning).SOLUTION: A method for manufacturing an article including a step of forming a pattern of a hard mask 17 on a substrate 11 includes a first step of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: KENMOCHI ATSUSHI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing an article advantageous in terms of overlay accuracy in double patterning (multi-patterning).SOLUTION: A method for manufacturing an article including a step of forming a pattern of a hard mask 17 on a substrate 11 includes a first step of forming a first pattern 14 on the substrate 11 by multi-patterning and a second step of embedding the hard mask 17 in a recess of the substrate 11 on which the first pattern 14 is formed.