PLASMA HEAT TREATMENT DEVICE

PROBLEM TO BE SOLVED: To provide a plasma heat treatment device capable of controlling temperature distribution in an electrode plane without increasing input power even when a large-diameter heated sample is heated using plasma.SOLUTION: A plasma heat treatment device comprises: a processing chambe...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MIYAKE MASATOSHI, KAWASAKI HIROMICHI, UEMURA TAKASHI, YOKOGAWA KATANOBU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma heat treatment device capable of controlling temperature distribution in an electrode plane without increasing input power even when a large-diameter heated sample is heated using plasma.SOLUTION: A plasma heat treatment device comprises: a processing chamber 100 which heats a workpiece 101; a first electrode 102 arranged in the processing chamber; a plate-like second electrode 103 arranged facing the first electrode 102; a high-frequency power source 111 which supplies high-frequency power to the first electrode 102 or the second electrode 103; and gas supply means 113 for supplying a gas into the processing chamber. The first electrode 102 has an opening.