SUBSTRATE STAGE, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a substrate stage which enables an edge region of a substrate to be exposed while the liquid immersion region is formed well when subjecting the edge region of the substrate to liquid immersion exposure.SOLUTION: A substrate stage PST can be moved while holding a sub...

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Bibliographische Detailangaben
Hauptverfasser:	IMAI MOTOMASA, NAGASAKA HIROYUKI, KUDO YOSHIHIKO, KONO HIROTAKA, TAKAIWA HIROAKI, NEI MASAHIRO, SHIRAISHI KENICHI, YAMATO SOICHI, UMAGOME NOBUTAKA, INOUE JIRO, HIRUKAWA SHIGERU, NISHII YASUFUMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a substrate stage which enables an edge region of a substrate to be exposed while the liquid immersion region is formed well when subjecting the edge region of the substrate to liquid immersion exposure.SOLUTION: A substrate stage PST can be moved while holding a substrate P being an exposure object. The substrate stage PST includes: a first circumferential wall; a second circumferential wall 33 formed inside the first circumferential wall; and a support part 34 formed inside the second circumferential wall 33. The support part 34 holds the substrate P by setting space surrounded by the second circumferential wall 33 at negative pressure.