FLUID SUPPLY APPARATUS FOR SYNTHESIZING GLASS

PROBLEM TO BE SOLVED: To provide a fluid supply apparatus for synthesizing glass capable of preventing deterioration of a pipe before and after MFC and a sensor of the MFC, while preventing leakage of a corrosive fluid.SOLUTION: A fluid supply apparatus 10 for synthesizing glass comprises: a purge g...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAGI MITSURU, HABASAKI TOSHIMI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a fluid supply apparatus for synthesizing glass capable of preventing deterioration of a pipe before and after MFC and a sensor of the MFC, while preventing leakage of a corrosive fluid.SOLUTION: A fluid supply apparatus 10 for synthesizing glass comprises: a purge gas supply line L1; a corrosive fluid supply line L2; a confluent line L3 formed by joining the purge gas supply line L1 with the corrosive fluid supply line L2; and MFC 5 provided on the confluent line L3. A reaction vessel 2 is connected to the downstream side of the MFC 5 on the confluent line L3, and air type operation valves 7a, 7b operated by electromagnetic valves 6a, 6b are provided on the purge gas supply line L1 and the corrosive fluid supply line L2, respectively. The air type operation valves 7a, 7b are all a normal close type, the MFC 5 are all a normal open type, the electromagnetic valve 6a for the purge gas supply line L1 is the normal open type, and the electromagnetic valve 6b for the corrosive fluid supply line L2 is the normal close type.