ALKALINE CLEANING METHOD OF NITROGEN-CONTAINING ORGANIC COMPOUND

PROBLEM TO BE SOLVED: To propose an alkaline cleaning method of a nitrogen-containing organic compound, firstly, with which a hardly-decomposable organic compound containing nitrogen such as an amide compound can be cleaned and decomposition treated, and secondly, which is simply, easily, and surely...

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Bibliographische Detailangaben
Hauptverfasser: SHIGEE SEIICHI, MURATA TOSHIAKI, NISHIMOTO SO, SEKINE TAKAO, TAMAGAWA JUNNOSUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To propose an alkaline cleaning method of a nitrogen-containing organic compound, firstly, with which a hardly-decomposable organic compound containing nitrogen such as an amide compound can be cleaned and decomposition treated, and secondly, which is simply, easily, and surely achieved.SOLUTION: In an alkaline cleaning method, an amide compound is cleaned and decomposition treated by imparting high-speed and strong stirring shear force thereto in an alkali aqueous solution, and a surface activating machine 1 is used. The surface activating machine 1 includes a disk-like stirring plate 4 with high-speed rotation installed in a stirring chamber 3 formed in a cylindrical drum 2, and a stirring blade 5 is provided on a plate face of the stirring plate 4 in a protruding condition. The amide compound or the like flows inside the surface activating machine 1 with the alkali aqueous solution and interfacial energy is transiently increased by imparting the stirring shear force. Consequently an addition reaction of a hydroxide ion to a carbonyl group of the amide compound, other addition reactions, a coordination reaction, a chain-transfer reaction and so on are accelerated.