MANUFACTURING METHOD OF MAGNETIC DISK SUBSTRATE

PROBLEM TO BE SOLVED: To provide a manufacturing method of a magnetic disk substrate capable of reducing plunge of alumina into the substrate after coarse polishing.SOLUTION: The manufacturing method of a magnetic disk substrate includes (1) a step of polishing a polishing object surface of a substr...

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Bibliographische Detailangaben
1. Verfasser:	OYAMA TSUBASA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GLASS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER JOINING GLASS TO GLASS OR OTHER MATERIALS MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS PHYSICS POLISHING SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a manufacturing method of a magnetic disk substrate capable of reducing plunge of alumina into the substrate after coarse polishing.SOLUTION: The manufacturing method of a magnetic disk substrate includes (1) a step of polishing a polishing object surface of a substrate to be polished by using a polishing liquid composition A containing alumina particles, silica particles, and water; (2) a step of rinsing the substrate obtained in the step 1; (3) a step of polishing a polishing object surface of the substrate, obtained in the step 2, by using a polishing liquid composition B containing silica particles and water; (4) a step of cleaning the substrate obtained in the step 3; and (5) a step of polishing the polishing object surface of the substrate, obtained in the step 4, by using a polishing liquid composition C containing silica particles and water. The steps 1 to 3 are implemented by using the same polishing machine, and the step 5 is performed by using a polishing machine different from the polishing machine used in the steps 1 to 3. The gross mass of silica particles used in the steps 1 to 3 is 65.0 mass% or more and 90.0 mass% or less of a sum of gross masses of the alumina particles and the silica particles used in the steps 1 to 3.