PELLICLE FOR LITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a pellicle for lithography, which does not scar a pellicle membrane even when the tautness of the pellicle membrane decreases and the pellicle membrane is slackened during a time of pellicle handling.SOLUTION: The present invention is characterized in that in a pelli...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	SHIRASAKI SUSUMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pellicle for lithography, which does not scar a pellicle membrane even when the tautness of the pellicle membrane decreases and the pellicle membrane is slackened during a time of pellicle handling.SOLUTION: The present invention is characterized in that in a pellicle for lithography comprising a pellicle membrane and a pellicle frame, to the upper end face of which the pellicle membrane is tensely adhered, the angle of a membrane-side inner-chamfering face of the pellicle frame, to which the pellicle membrane is adhered, is less than 45 degrees. It is preferable that the angle of the membrane-side inner-chamfering face of the pellicle frame is 10-30 degrees.