SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To remove particles adhering to a substrate, while suppressing pattern collapse or erosion of a base film.SOLUTION: A substrate cleaning system comprises: a first processing section; and a second processing section. The first processing section includes a first holding section...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KANEKO MIYAKO, SUGANO ITARU, ORII TAKEHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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