INKJET INK COMPOSITION FOR ETCHING RESIST

PROBLEM TO BE SOLVED: To provide an inkjet ink composition for an etching resist suitable for inkjet printing, the composition to be used for forming an etching resist layer that can be completely stripped in a short time (in about several seconds) with an alkali stripping solution at a low density...

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Hauptverfasser: SHINGU SUSUMU, SARUWATARI MASATAKA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an inkjet ink composition for an etching resist suitable for inkjet printing, the composition to be used for forming an etching resist layer that can be completely stripped in a short time (in about several seconds) with an alkali stripping solution at a low density not to corrode a metal foil.SOLUTION: The inkjet ink composition for an etching resist includes: (1) a water-soluble solvent having a boiling point of 100 to 250°C; (2) a water-soluble resin having an acid value of 100 mgKOH/g or more and having no hydroxyl group, by 1 to 20 wt.%; and (3) a neutral amine as much as 100 to 150% of a neutralization equivalent quantity of an acid component in the composition derived from the water-soluble resin.