METHOD FOR MANUFACTURING NONWOVEN FABRIC SUBSTRATE FOR AIR FILTER OR MASK

PROBLEM TO BE SOLVED: To provide a method for manufacturing a nonwoven fabric substrate for an air filter or a mask having high efficiency, low pressure loss, durability for long-term use and high reliability by using a nanofiber.SOLUTION: The method for manufacturing a nonwoven fabric substrate for...

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Bibliographische Detailangaben
Hauptverfasser: KENJO TAKASHI, CHIKAISHI NAOKI, YOSHIMOTO SHOTA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a nonwoven fabric substrate for an air filter or a mask having high efficiency, low pressure loss, durability for long-term use and high reliability by using a nanofiber.SOLUTION: The method for manufacturing a nonwoven fabric substrate for an air filter or a mask includes a first step to a third step as given below: a first step of laminating a nonwoven fabric layer B of a nanofiber having an average fiber diameter of 50-400 nm in a basis weight of 0.03-1.0 g/mon one upper surface of a nonwoven fabric A to manufacture a composite nonwoven fabric C; a second step of randomly spraying a moisture-curable polyurethane adhesive spun in a fibrous form or a hot-melt adhesive on a nonwoven fabric D and heating and melting; and a third step of laminating the composite nonwoven fabric C on the nonwoven fabric D to which the adhesive is applied, exuding the adhesive in the layer of the composite nonwoven fabric C and bonding them by a cold press roll to manufacture a nonwoven fabric substrate for an air filter or a mask.