INSPECTION DEVICE USING CHARGED PARTICLE BEAM, AND METHOD OF MANUFACTURING DEVICE USING THE INSPECTION DEVICE

PROBLEM TO BE SOLVED: To prevent unevenness of a charge amount on a substrate surface.SOLUTION: An electron beam inspection device for inspecting a substrate W by using an electron beam includes: an electron gun 59-6 for irradiating an inspected area of the substrate W; a detector 59-4 for detecting...

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Hauptverfasser: KANEUMA TOSHIFUMI, SUEMATSU KENICHI, TAJIMA RYO, MURAKAMI TAKESHI, TOYAMA KEIICHI, KARIMATA TSUTOMU, NOJI NOBUHARU, YOSHIKAWA SEIJI, TABE YUTAKA, HATAKEYAMA MASAKI, WATANABE KENJI, SATAKE TORU, SOFUGAWA TAKUJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent unevenness of a charge amount on a substrate surface.SOLUTION: An electron beam inspection device for inspecting a substrate W by using an electron beam includes: an electron gun 59-6 for irradiating an inspected area of the substrate W; a detector 59-4 for detecting electrons emitted from the substrate W; and a pre-charge unit 59-5. The pre-charge unit 59-5 is at least one of: means of irradiating an area including an inspection area with an electron beam before irradiation of an electron beam; means of coating the area including the inspection area with a conductive film before irradiation of an electron beam; means of spraying negative gas of argon, oxygen or the like onto the surface of the substrate W during inspection; and means 59-21 of performing adjustment so as to be in a negative charge mode having irradiation energy of 3-5 keV; and means of performing adjustment so as to inspect a reflection electron in irradiation energy of 0.5-3 keV.