VAPORIZER DELIVERY AMPOULE

PROBLEM TO BE SOLVED: To provide a vaporizer system and a method for vaporizing efficiently a solid and/or liquid chemical source, which is used for a chemical vapor deposition (CVD) method and an ion implantation method.SOLUTION: In a vaporizer delivery system 10 used for a semiconductor manufactur...

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Bibliographische Detailangaben
Hauptverfasser:	NAITO DONN, LAXMAN RAVI K, BATTLE SCOTT, FUIERER MARIANNE, GREGG JOHN, BANTON JEFFREY I
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a vaporizer system and a method for vaporizing efficiently a solid and/or liquid chemical source, which is used for a chemical vapor deposition (CVD) method and an ion implantation method.SOLUTION: In a vaporizer delivery system 10 used for a semiconductor manufacturing process, a plurality of vertically stacked containers 22 for holding a vaporizable source material include a plurality of perforated projection parts 30 extending to the inside of each stacked container, to thereby provide a passage for allowing passage of carrier gas between vertically stacked adjacent containers 22.