SAMPLE HOLDER

PROBLEM TO BE SOLVED: To provide a sample holder used as an electrode in a processing apparatus, and capable of improving the in-plane distribution of a film formed on a substrate mounted.SOLUTION: The sample holder stored in a semiconductor manufacturing apparatus, and can be used as an electrode i...

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Bibliographische Detailangaben
Hauptverfasser:	SARUWATARI TETSUYA, IMAI DAISUKE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a sample holder used as an electrode in a processing apparatus, and capable of improving the in-plane distribution of a film formed on a substrate mounted.SOLUTION: The sample holder stored in a semiconductor manufacturing apparatus, and can be used as an electrode in the processing by the semiconductor manufacturing apparatus has a substrate mounting surface of uniform height, in which a substrate mounting region for mounting a processed substrate is defined to extend in the vertical direction. At least the region of the substrate mounting surface, defining the substrate mounting region, is entirely composed of a porous material.